Process-Parameter-Dependent Structural, Electrical, and Optical Properties of Reactive Magnetron Sputtered Ag-Cu-O Films by P. Narayana Reddy, Adem Sreedhar, M. Hari Prasad Reddy, S. Uthanna, Jean-François Pierson.
Silver-copper-oxide thin films were formed by RF magnetron sputtering technique using Ag 80 Cu 20 target at various oxygen partial pressures in the range 5 × 10 −3 –8 ×10 −2 Pa and substrate temperatures 303–523 K. The effect of pressure temperature on structure surface morphology electrical optical properties studied. Ag-Cu-O room (303 K) low mixed phase 2 O 3 Ag, while those deposited composed 4 phases. crystallinity increased with increase from 303 to 423 Further 523 K, decomposed resistivity decreased 0.8 Ωcm 473 K due improvement phase. band gap 1.47 1.83 eV
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